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Published on: May 12, 2020
MZI optical isolator with Si-wire waveguides by surface-activated direct bonding
Yuya Shoji1, Masatoshi Ito, Yuya Shirato
1Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, 2-12-1-S3-11 Ookayama, Tokyo 152-8552, Japan. shoji.y.ad@m.titech.ac.jp
Optics Express
|October 6, 2012
Summary
Researchers developed a compact optical isolator using silicon-wire waveguides and magneto-optic garnet. This device achieved a significant magneto-optic phase shift and high optical isolation, paving the way for miniaturized photonic integrated circuits.
Area of Science:
- Photonics
- Materials Science
- Nanotechnology
Background:
- Optical isolators are crucial components in photonic integrated circuits, preventing back-reflection and ensuring signal integrity.
- Miniaturization of optical devices is a key challenge in advancing integrated photonics.
Purpose of the Study:
- To fabricate a compact Mach-Zehnder interferometer-based optical isolator.
- To investigate the effectiveness of direct bonding techniques for integrating magneto-optic garnet with silicon-wire waveguides.
- To achieve high optical isolation in a reduced device footprint.
Main Methods:
- Fabrication of a Mach-Zehnder interferometer using silicon-wire waveguides.
- Integration of magneto-optic garnet cladding via surface-activated direct bonding with nitrogen plasma treatment.
- Characterization of the optical performance, including magneto-optic phase shift and optical isolation, at a wavelength of 1322 nm.
Main Results:
- Successful fabrication of a significantly smaller optical isolator compared to previous devices.
- Demonstration of superior direct bonding results using nitrogen plasma treatment over oxygen plasma treatment.
- Achieved a large magneto-optic phase shift of 0.8π and an optical isolation of 18 dB at 1322 nm.
Conclusions:
- The developed silicon-wire waveguide optical isolator offers a compact and efficient solution for integrated photonics.
- Surface-activated direct bonding with nitrogen plasma treatment is an effective method for fabricating such devices.
- The achieved performance metrics indicate the potential for practical applications in optical communication and signal processing.

