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Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
Shiwei Wu1, Wei-Tao Liu, Xiaogan Liang
1The Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA. swwu@fudan.edu.cn
Hot phonon relaxation in graphene is mainly driven by phonon-phonon interactions and substrate effects, not Landau damping. This research aids in managing energy dissipation in graphene devices.
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