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Updated: May 17, 2026

Theoretical Calculation and Experimental Verification for Dislocation Reduction in Germanium Epitaxial Layers with Semicylindrical Voids on Silicon
Published on: July 17, 2020
Morphological evolution of Ge/Si(001) quantum dot rings formed at the rim of wet-etched pits
Martyna Grydlik1, Moritz Brehm, Friedrich Schäffler
1Institut für Halbleiter-und Festkörperphysik, Johannes Kepler Universität, Altenbergerstr, 69, Linz, 4040, Austria. martyna.grydlik@jku.at.
Abstract:
We demonstrate the formation of Ge quantum dots in ring-like arrangements around predefined {111}-faceted pits in the Si(001) substrate. We report on the complex morphological evolution of the single quantum dots contributing to the rings by means of atomic force microscopy and demonstrate that by careful adjustment of the epitaxial growth parameters, such rings containing densely squeezed islands can be grown with large spatial distances of up to 5 μm without additional nucleation of randomly distributed quantum dots between the rings.

