A new perfluoropolyether-based hydrophobic and chemically resistant photoresist structured by two-photon

Carmela De Marco1, Arune Gaidukeviciute, Roman Kiyan

  • 1Dipartimento di Chimica, Materiali e Ingegneria Chimica Giulio Natta, Politecnico di Milano, Piazza Leonardo da Vinci 32, 20133 Milan, Italy. carmela.demarco@chem.polimi.it