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Published on: December 14, 2017
[Radiation thermometry based on calibration of spectral responsivity]
Cheng-Yun Xin1, Xiao-Fang Cheng, Zhong-Zheng Zhang
1Department of Thermal Science and Energy Engineering, University of Science and Technology of China, Hefei 230027, China. xchyun@mail.ustc.edu.cn
This study presents a novel radiation thermometry method that eliminates the need for space position calibration. The technique allows for accurate true surface temperature measurement by incorporating a non-spectral parameter into emissivity modeling.
Area of Science:
- Physics
- Thermodynamics
- Optical Engineering
Context:
- Accurate surface temperature measurement is crucial in various industrial and scientific applications.
- Traditional radiation thermometry often requires precise calibration of the spatial relationship between the target and the sensor.
- Simultaneous measurement of emissivity and temperature presents challenges due to interdependent parameters.
Purpose:
- To develop a radiation thermometry method that obviates the need for space position calibration.
- To integrate the non-spectral parameter, dependent on target-lens position, into emissivity modeling.
- To enable accurate true surface temperature determination without data normalization.
Summary:
- A new approach models the non-spectral parameter within the emissivity function using finite series, bypassing the need for spatial calibration.
- This method allows for the determination of true surface temperature and the trend of spectral emissivity, rather than its exact value.
- Multi-wavelength thermometry equations yield unique solutions when channel wavelengths differ, unlike multi-band approaches with variable solution numbers.
Impact:
- Simplifies the process of radiation thermometry, making it more accessible and cost-effective.
- Enhances the accuracy and reliability of temperature measurements in environments where spatial calibration is difficult.
- Provides a robust method for characterizing emissivity trends, aiding in material analysis and process control.
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