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|January 8, 2013
Summary
Atom probe tomography (APT) was used to measure arsenic implant doses in a NIST standard material. A 4% variation was observed, and methods to reduce this variation are discussed.
Area of Science:
- Materials Science
- Metrology
Background:
- Accurate dose measurements are crucial for semiconductor manufacturing.
- Atom probe tomography (APT) is a powerful technique for nanoscale analysis.
Purpose of the Study:
- To report atom probe tomography implant dose measurements for NIST Standard Reference Material 2134 (arsenic implant).
- To investigate factors influencing dose measurement variation in APT.
Main Methods:
- Utilized a tip profile reconstruction method for APT analysis.
- Manufactured specimens with controlled size and shape to minimize reconstruction parameter variations.
- Required inputs included tip profile, post-analysis specimen radius, and sphere-to-cone radius ratio.
Main Results:
- Observed a 4% variation in dose measurements under the specified conditions.
- Identified key parameters affecting measurement accuracy in APT.
Conclusions:
- The study demonstrates the feasibility of APT for precise implant dose measurements.
- Further considerations are needed to minimize variation and approach the limit imposed by counting statistics for improved accuracy.
Keywords:
Atom probe tomography
