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Published on: December 25, 2015
Rapid prototyping of PDMS devices using SU-8 lithography
1Institute of Advanced Materials (IAM), Key Laboratory for Organic Electronics and Information Displays, Nanjing University of Posts and Telecommunication, Nanjing, China. g.jenkins@imperial.ac.uk
Methods in Molecular Biology (Clifton, N.J.)
|January 19, 2013
Summary
This protocol details fabricating microfluidic devices using SU-8 (a photoresist) and PDMS (polydimethylsiloxane) casting. It offers practical tips for SU-8 processing to overcome common challenges in microfluidics fabrication.
Area of Science:
- Microfluidics
- MEMS (Micro-Electro-Mechanical Systems)
- Materials Science
Background:
- SU-8 photoresist is widely used in MEMS for high aspect ratio microstructures.
- It is popular for creating molds for polydimethylsiloxane (PDMS) casting in microfluidics.
- SU-8 processing is known for its complexity and potential pitfalls.
Purpose of the Study:
- To provide a comprehensive protocol for fabricating microfluidic devices.
- To share practical tips and tricks for successful SU-8 photoresist processing.
- To guide researchers in creating single and multi-layer SU-8 microstructures for PDMS casting.
Main Methods:
- Fabrication of SU-8 microstructures (single and multi-layer).
- Polydimethylsiloxane (PDMS) casting using SU-8 molds.
- Plasma bonding for assembling complete microfluidic devices.
Main Results:
- Successful generation of SU-8 molds for microfluidic devices.
- Demonstration of PDMS casting for rapid replication of microfluidic structures.
- Assembly of functional microfluidic devices through plasma bonding.
Conclusions:
- This protocol offers a detailed guide to overcome SU-8 processing challenges.
- It enables efficient fabrication of microfluidic devices using SU-8 and PDMS.
- The described methods facilitate the creation of ready-to-use microfluidic devices for laboratory applications.
