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Updated: May 14, 2026

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates
Published on: July 2, 2012
Marta Palacios1, Olga García, Juan Rodríguez-Hernández
1Department of Chemistry and Properties of Polymers, Instituto de Ciencia y Tecnología de Polímeros (ICTP-CSIC), Juan de la Cierva 3, 28006 Madrid, Spain.
This study demonstrates a novel UV-based photolithography technique for creating custom surface patterns on polystyrene. The method allows for tunable negative or positive patterning by controlling UV exposure and material composition, altering both morphology and chemical properties.
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