Intrinsic point-defect balance in self-ion-implanted ZnO
Pekka T Neuvonen1, Lasse Vines, Bengt G Svensson
1Department of Physics, Centre for Material Science and Nanotechnology, University of Oslo, PO Box 1048 Blindern, N-0316 Oslo, Norway. neuvonen@phys.au.dk
Excess zinc (Zn) interstitials released during annealing of Zn-implanted ZnO cause lithium (Li) depletion and lower electrical resistivity. Oxygen (O) implantation, however, leads to Li accumulation and increased resistivity due to stable O interstitials.
Area of Science:
- Materials Science
- Solid State Physics
- Semiconductor Science
Background:
- Understanding point defect behavior in lithium-doped zinc oxide (ZnO) is crucial for its electronic applications.
- Residual point defects significantly influence the electrical properties of semiconductor materials.
- The interplay between intrinsic atoms and dopants like lithium affects defect dynamics.
Purpose of the Study:
- To investigate the role of excess intrinsic atoms (Zn or O) in the point defect balance of Li-containing ZnO.
- To elucidate the mechanisms of lithium redistribution and their impact on electrical resistivity after ion implantation and annealing.
- To differentiate the effects of Zn and O interstitials on defect compensation.
Main Methods:
- Ion implantation of Zn or O ions into Li-containing ZnO.
- Post-implantation annealing at temperatures ≥ 600 °C.
- Monitoring of lithium redistribution and electrical resistivity using techniques like secondary ion mass spectrometry and four-point probe measurements.
- Control experiments using inert ion implantation (Ar, Ne) to isolate the effects of intrinsic atoms.
Main Results:
- Zn implantation followed by annealing induced Li-depleted regions beyond the projected range, correlating with decreased electrical resistivity.
- O implantation resulted in Li accumulation at the projected range and increased resistivity.
- Control samples implanted with Ar or Ne showed no Li depletion, confirming the role of excess intrinsic Zn atoms.
- Evidence suggests excess Zn interstitials (Zn(I)) convert substitutional Li (Li(Zn)) to mobile interstitial Li, causing depletion.
- Stable O interstitials (O(I)) in O-implanted samples act as acceptors, increasing resistivity.
Conclusions:
- Excess Zn interstitials are responsible for lithium depletion and resistivity reduction in Zn-implanted ZnO.
- Oxygen interstitials contribute to stable acceptor formation, increasing resistivity in O-implanted ZnO.
- The study clarifies the distinct roles of excess intrinsic Zn and O atoms in defect compensation mechanisms in ZnO.
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