Related Experiment Video
Updated: May 14, 2026

13:05
Plasma-Assisted Molecular Beam Epitaxy Growth of Mg3N2 and Zn3N2 Thin Films
Published on: May 11, 2019
Structural and optoelectronic characterization of RF sputtered ZnSnN(2)
Lise Lahourcade1, Naomi C Coronel, Kris T Delaney
1Thomas J. Watson Laboratories of Applied Physics, California Institute of Technology, Pasadena, CA 91125, USA.
Advanced Materials (Deerfield Beach, Fla.)
|February 7, 2013
Abstract:
ZnSnN(2), a new earth-abundant semiconductor, is synthesized and characterized for use as a photovoltaic absorber material. Results confirm the predicted orthorhombic Pna2(1) crystal structure in RF sputtered thin films. Additionally, optical measurements reveal a direct bandgap of about 2 eV, which is larger than our calculated bandgap of 1.42 eV due to the Burstein-Moss effect.

