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Updated: May 14, 2026
Fabrication of 1-D Photonic Crystal Cavity on a Nanofiber Using Femtosecond Laser-induced Ablation
Published on: February 25, 2017
Plow and ridge nanofabrication.
Wooyoung Shim1, Keith A Brown, Xiaozhu Zhou
1Department of Materials Science and Engineering, Northwestern University, 2220 Campus Drive, Evanston, IL 60208, USA.
This study introduces a new scanning probe lithography method that overcomes tip limitations. It achieves 20 nm resolution by patterning natural polymer ridges formed on soft surfaces.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Science
Background:
- Scanning probe lithography (SPL) resolution is typically limited by tip geometry.
- Existing SPL techniques face challenges in achieving ultra-high resolution patterning.
Purpose of the Study:
- To develop a novel patterning approach for scanning probe lithography.
- To overcome the inherent resolution limitations imposed by tip radius of curvature.
Main Methods:
- Utilizing the natural ridge of piled-up polymer formed when a scanning probe contacts a soft surface.
- Employing this polymer ridge phenomenon for pattern transfer to hard materials.
Main Results:
- Demonstrated a new method for high-resolution patterning using SPL.
- Achieved a resolution of 20 nm in pattern transfer to hard materials.
Conclusions:
- The described approach effectively bypasses traditional SPL resolution limits.
- This technique offers a viable route for nanoscale patterning with high fidelity.
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