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Updated: May 13, 2026

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
Published on: December 16, 2011
Anisotropic crystalline organic step-flow growth on deactivated Si surfaces
Sean R Wagner1, Richard R Lunt, Pengpeng Zhang
1Department of Physics and Astronomy, Michigan State University, East Lansing, Michigan 48824-2320, USA.
Abstract:
We report the first demonstration of anisotropic step-flow growth of organic molecules on a semiconducting substrate using metal phthalocyanine thermally deposited on the deactivated Si(111)-B sqrt[3]×sqrt[3] R30° surface. With scanning probe microscopy and geometric modeling, we prove the quasiepitaxial nature of this step-flow growth that exhibits no true commensurism, despite a single dominant long-range ordered relationship between the organic crystalline film and the substrate, uniquely distinct from inorganic epitaxial growth. This growth mode can likely be generalized for a range of organic molecules on deactivated Si surfaces and access to it offers new potential for the integration of ordered organic thin films in silicon-based electronics.

