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Related Experiment Video

Updated: May 12, 2026

High-speed Particle Image Velocimetry Near Surfaces
11:59

High-speed Particle Image Velocimetry Near Surfaces

Published on: June 24, 2013

Improving vector vortex waveplates for high-contrast coronagraphy.

Sarik R Nersisyan1, Nelson V Tabiryan, Dimitri Mawet

  • 1BEAM Engineering for Advanced Measurements Co., 809 S. Orlando Ave., Suite I, Winter Park, FL 32789, USA.

Optics Express
|April 11, 2013
PubMed
Summary
This summary is machine-generated.

Researchers improved vector vortex waveplates (VVWs) by reducing central defects, enhancing their use in stellar coronagraphy and optical communications. This advancement enables high-quality VVWs with smaller defects for advanced optical applications.

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Last Updated: May 12, 2026

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Published on: August 12, 2013

Area of Science:

  • Optics and Photonics
  • Materials Science

Background:

  • Vector vortex waveplates (VVWs) are crucial for applications like stellar coronagraphy and optical communications.
  • Current liquid-crystal-polymer-based VVWs suffer from performance limitations due to axial defects in the vortex pattern.

Purpose of the Study:

  • To develop methods for reducing axial defects in VVWs.
  • To enable the fabrication of large-area, high-topological-charge VVWs with improved performance.

Main Methods:

  • Utilized photoalignment materials with high photosensitivity and reversible response.
  • Reduced exposure energy during fabrication.
  • Redistributed writing beam intensity from the axial region to the periphery.
  • Employed VVWs as linear to axial polarization converters.

Main Results:

  • Achieved significant reduction in the size of axial defects in VVWs.
  • Fabricated large-area VVWs with small defect areas.
  • Successfully produced VVWs with topological charges of 1 and 2, featuring central defect sizes below 3 μm.
  • Reduced photoalignment time to a few minutes.

Conclusions:

  • The developed techniques effectively minimize central defects in VVWs.
  • These advancements pave the way for high-performance VVWs suitable for demanding optical applications.
  • The improved fabrication process allows for higher topological charges and faster production times.