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Interferometric method to measure the Goos-Hänchen shift.

Chandravati Prajapati¹, Dilip Ranganathan, Joby Joseph

¹Department of Physics, Indian Institute of Technology Delhi, Hauz Khas, New Delhi 110016, India. chandra9.iitd@gmail.com

Journal of the Optical Society of America. A, Optics, Image Science, and Vision

|April 19, 2013

Summary

This summary is machine-generated.

This study introduces a novel interferometric method to measure the Goos-Hänchen (GH) shift by observing interference between p- and s-polarized beams. The technique allows simultaneous measurement across the entire beam profile, showing good agreement with theoretical calculations.

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Area of Science:

Optics
Photonics
Quantum Optics

Background:

The Goos-Hänchen (GH) shift is a fundamental phenomenon in optics, describing the transverse displacement of a light beam upon reflection.
Existing methods for measuring the GH shift often lack precision or the ability to analyze the entire beam profile.

Purpose of the Study:

To propose and demonstrate a novel interferometric method for accurately measuring the Goos-Hänchen (GH) shift.
To enable simultaneous measurement of GH shifts for both p- and s-polarized beams across the entire beam profile.

Main Methods:

An interferometric technique was developed, utilizing the interference between p- and s-polarized beams.
The method was demonstrated by measuring the GH shift for aluminum and glass samples at various incidence angles (20°–70°) using a helium-neon laser.
Measurements were taken across the entire beam profile, accommodating arbitrary beam profiles.

Main Results:

The proposed method successfully measured the GH shift for aluminum and glass.
Experimental results showed good agreement with theoretical calculations.
The technique allows for the measurement of GH shifts at any point across the beam profile, offering unprecedented detail.

Conclusions:

The developed interferometric method provides a robust and versatile approach for measuring the Goos-Hänchen shift.
This technique overcomes limitations of current methods by enabling comprehensive analysis of the entire beam profile.
The findings validate the method's accuracy and its potential for broader applications in optical metrology.