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A damascene platform for controlled ultra-thin nanowire fabrication
M Guilmain1, T Labbaye, F Dellenbach
1Laboratoire Nanotechnologies et Nanosystèmes-UMI-LN2 346, CNRS/INSA Lyon/ECL/CPE Lyon/UJF 3IT, Université de Sherbrooke, Sherbrooke, QC, Canada.
Nanotechnology
|May 23, 2013
Summary
Researchers developed a damascene process for creating precise titanium nanostructures. This method enables adjustable thickness down to 2 nm using chemical-mechanical planarization and electrical characterization for accurate depth control.
Area of Science:
- Materials Science
- Nanotechnology
- Electrical Engineering
Background:
- Fabrication of titanium micro/nanostructures requires precise control over dimensions.
- Existing methods may lack the resolution for nanoscale thickness control.
Purpose of the Study:
- To present a novel damascene process for fabricating titanium micro/nanostructures and nanowires.
- To achieve adjustable thickness down to 2 nm with high precision.
- To develop a reliable method for end-point detection in nanostructure fabrication.
Main Methods:
- Utilized a damascene process for titanium fabrication.
- Employed chemical-mechanical planarization (CMP) for precise depth control.
- Integrated in-process electrical characterization with a resistivity-thickness model for real-time monitoring.
Main Results:
- Successfully fabricated titanium nanowire test structures with thicknesses from 2 to 25 nm.
- Achieved precise control over nanostructure depth down to the nanometer range.
- Demonstrated a planarization end-point detection method applicable to metal nanostructures.
Conclusions:
- The developed damascene process offers precise control over titanium nanostructure dimensions.
- The integrated electrical characterization and modeling provide an effective end-point detection strategy.
- The method is suitable for fabricating advanced titanium-based nanoelectronic devices.
