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Updated: May 11, 2026

Fabrication and Optimization of Type II Silicon Clathrate Films
Published on: October 14, 2025
The structures of neutral transition metal doped silicon clusters, Si(n)X (n = 6-9; X = V, Mn)
Pieterjan Claes1, Vu Thi Ngan, Marko Haertelt
1Laboratory of Solid State Physics and Magnetism, KU Leuven, Celestijnenlaan 200D, B-3001 Leuven, Belgium.
Abstract:
We present a combined experimental and theoretical investigation of small neutral vanadium and manganese doped silicon clusters Si(n)X (n = 6-9, X = V, Mn). These species are studied by infrared multiple photon dissociation and mass spectrometry. Structural identification is achieved by comparison of the experimental data with computed infrared spectra of low-lying isomers using density functional theory at the B3P86∕6-311+G(d) level. The assigned structures of the neutral vanadium and manganese doped silicon clusters are compared with their cationic counterparts. In general, the neutral and cationic Si(n)V(0,+) and Si(n)Mn(0,+) clusters have similar structures, although the position of the capping atoms depends for certain sizes on the charge state. The influence of the charge state on the electronic properties of the clusters is also investigated by analysis of the density of states, the shapes of the molecular orbitals, and NBO charge analysis of the dopant atom.
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