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Updated: May 10, 2026

Non-equilibrium Microwave Plasma for Efficient High Temperature Chemistry
Published on: August 1, 2017
Plasma debris sputter resistant x-ray mirror
Sho Amano1, Tomoaki Inoue, Tetsuo Harada
1Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Ako, Hyogo, Japan. sho@lasti.u-hyogo.ac.jp
Abstract:
A diamond-like carbon (DLC) mirror, used as a grazing incident mirror in a plasma x-ray source, exhibits a high resistance to plasma debris sputtering. Good mirror reflectivity at a wavelength of 13.5 nm was confirmed using synchrotron radiation at the NewSUBARU facility. The erosion rate due to plasma debris sputtered at the incident debris angle of 20° was measured using a laser-produced Xe plasma source developed by the authors. The results indicate that the DLC film has a 5- and 15-fold higher sputtering resistance compared to films made of the traditional mirror materials Ru and Au, respectively. Because the DLC mirror retains a high sputtering resistance to Sn ions, it may be effective in Sn plasma source applications. We conclude that a grazing incident x-ray mirror coated with DLC can be of use as a plasma debris sputtering resistant mirror.
