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Updated: May 10, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Zongsong Gan1, Yaoyu Cao, Richard A Evans
1Centre for Micro-Photonics and CUDOS, Faculty of Engineering and Industrial Sciences, Swinburne University of Technology, Hawthorn, Victoria 3122, Australia.
Researchers developed a 3D optical lithography technique achieving 9nm feature sizes. This maskless laser direct writing method offers resolution comparable to electron beam lithography for advanced nanofabrication.
09:06Expanding Nanopatterned Substrates Using Stitch Technique for Nanotopographical Modulation of Cell Behavior
Published on: December 8, 2016
09:45Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies
Published on: June 12, 2018
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