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Three-Dimensional Microscopy in Microbiology

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Related Experiment Video

Updated: May 10, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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Published on: September 14, 2018

Three-dimensional deep sub-diffraction optical beam lithography with 9 nm feature size.

Zongsong Gan1, Yaoyu Cao, Richard A Evans

  • 1Centre for Micro-Photonics and CUDOS, Faculty of Engineering and Industrial Sciences, Swinburne University of Technology, Hawthorn, Victoria 3122, Australia.

Nature Communications
|June 21, 2013
PubMed
Summary
This summary is machine-generated.

Researchers developed a 3D optical lithography technique achieving 9nm feature sizes. This maskless laser direct writing method offers resolution comparable to electron beam lithography for advanced nanofabrication.

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Area of Science:

  • Nanotechnology
  • Optical Engineering
  • Materials Science

Background:

  • Current nanofabrication methods like electron beam lithography offer nanometer resolution but struggle with arbitrary 3D structures.
  • Far-field 3D optical lithography using focused laser beams enables maskless direct writing but is limited by light diffraction for nanoscale features.

Purpose of the Study:

  • To demonstrate 3D optical beam lithography with deep sub-diffraction limit resolution.
  • To investigate the performance of a novel two-photon absorption resin for high-resolution 3D nanofabrication.

Main Methods:

  • Utilized a newly developed two-photon absorption resin with enhanced mechanical strength.
  • Employed far-field 3D optical beam lithography for maskless direct laser writing.

Main Results:

  • Achieved a minimum feature size of 9 nanometers.
  • Demonstrated a two-line resolution of 52 nanometers.
  • Confirmed that feature size and resolution can reach deep sub-diffraction scales, limited by resin mechanical strength.

Conclusions:

  • The developed 3D optical beam lithography technique overcomes diffraction limits for nanoscale feature fabrication.
  • The new resin enables high-resolution 3D nanofabrication, paving the way for portable maskless laser direct writing systems.
  • This technology offers resolution comparable to electron beam lithography, advancing 3D nanofabrication capabilities.