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Published on: September 27, 2011
Enhanced refractive index sensitivity of elevated short-range ordered nanohole arrays in optically thin plasmonic Au
Vladimir E Bochenkov1, Maj Frederiksen, Duncan S Sutherland
1Interdisciplinary Nanoscience Center (iNANO), Aarhus University, Aarhus, Denmark.
Abstract:
A simple development of the colloidal lithography technique is demonstrated for fabrication of perforated plasmonic metal films elevated above the substrate surface. The bulk refractive index sensitivity of short-range ordered nanohole arrays in 20 nm thick Au films exhibits an increase of up to 37% due to reduction of substrate effect caused by lifting with a 40 nm silica layer. Analysis of the local electric field distribution suggests that the sensitivity increase is due to revealing of the enhanced field near the holes.
