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Patterning via Optical Saturable Transitions - Fabrication and Characterization
Published on: December 11, 2014
Shiyuan Liu1, Xinjiang Zhou, Wen Lv
1Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China. shyliu@mail.hust.edu.cn
We developed convolution-variation separation (CVS), a new method for accurate and efficient optical imaging simulations. This approach speeds up calculations for various process variations, crucial for advanced lithography and metrology.
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