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Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
Published on: December 16, 2011
Lithographically patterned thin activated carbon films as a new technology platform for on-chip devices
Lu Wei1, Naoki Nitta, Gleb Yushin
1School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332-0245, United States.
ACS Nano
|July 3, 2013
Summary
Researchers developed lithographically patterned activated carbon films (ACFs) for high-performance electrical double-layer capacitors. These thin ACF films offer excellent capacitance and stability for on-chip energy storage devices.
Area of Science:
- Materials Science
- Electrochemistry
- Nanotechnology
Background:
- Activated carbon films (ACFs) are crucial for electrochemical energy storage.
- Developing thin, defect-free ACFs with tunable properties remains a challenge.
Purpose of the Study:
- To develop a method for preparing continuous, lithographically patterned activated carbon films (ACFs).
- To utilize these thin ACF films in prototype electrical double-layer capacitor devices.
- To evaluate the electrochemical performance and stability of ACF-based electrodes.
Main Methods:
- Lithographic patterning of activated carbon films on silicon wafers.
- Tuning synthesis and activation conditions to control surface area and porosity.
- Fabrication and electrochemical testing of electrical double-layer capacitor prototypes.
Main Results:
- Achieved high specific capacitance (>510 F g⁻¹ at 1 mV s⁻¹) and volumetric capacitance (>390 F cm⁻³).
- Demonstrated excellent performance at ultrahigh current densities (>325 F g⁻¹ at 45,000 mA g⁻¹).
- Exhibited good stability with over 10,000 charge-discharge cycles.
Conclusions:
- The developed thin ACF technology enables the fabrication of high-performance energy storage devices.
- ACF electrodes show great potential for on-chip micro-electrochemical capacitors.
- Tunable porosity and high capacitance make ACFs suitable for advanced microelectronic applications.

