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Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
Published on: November 1, 2013
Isolated nanographene crystals for nano-floating gate in charge trapping memory
Rong Yang1, Chenxin Zhu, Jianling Meng
1Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Science, Beijing 100190, China.
Scientific Reports
|July 4, 2013
Summary
Researchers developed a novel non-volatile memory using nanographene crystals. This graphene memory offers a large memory window, long retention, and high stability for integrated nanoscale applications.
Area of Science:
- Materials Science
- Nanotechnology
- Electronics Engineering
Background:
- Graphene's unique electronic properties, low dimensionality, and robustness make it promising for charge storage in memory devices.
- The demand for miniaturized and scaled-up devices necessitates advanced materials like nanostructured graphene.
Purpose of the Study:
- To propose and investigate a novel non-volatile charge trapping memory device.
- To utilize isolated and uniformly distributed nanographene crystals as a nano-floating gate.
- To demonstrate controllable capacity and excellent uniformity in the nanographene memory.
Main Methods:
- Fabrication of a non-volatile charge trapping memory structure.
- Utilizing nanographene crystals as the nano-floating gate.
- Employing different tunneling layers to tune memory performance.
Main Results:
- Achieved a large memory window of 4.5 V at a low operation voltage of ±8 V.
- Demonstrated excellent data retention exceeding 10 years.
- Exhibited high chemical and thermal stability up to 1000°C.
- Showcased tunable memory performance by varying tunneling layers.
Conclusions:
- The nanographene charge trapping memory offers significant advantages in performance and stability.
- Fabrication is compatible with existing semiconductor processes, enabling low-cost integrated nanoscale memory.
- This technology holds promise for future advanced memory applications.

