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Updated: May 9, 2026
10:08
Fabrication of Large-area Free-standing Ultrathin Polymer Films
Published on: June 3, 2015
Non-porous low-k dielectric films based on a new structural amorphous fluoropolymer
Chao Yuan1, Kaikai Jin, Kai Li
1Key Laboratory of Organofluorine Chemistry and Laboratory for Polymer Materials, Shanghai Institute of Organic Chemistry, Chinese Academy of Sciences, 345 Lingling Road, Shanghai 200032, P.R. China.
Advanced Materials (Deerfield Beach, Fla.)
|July 17, 2013
Abstract:
A non-porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 and dielectric loss less than 1.2 × 10(-3) is reported here. PFN also exhibits good mechanical properties and high thermostability. This study is a new example of a fully dense material showing a low k value and having good thermo/mechanical properties.
