Updated: May 8, 2026

Expanding Nanopatterned Substrates Using Stitch Technique for Nanotopographical Modulation of Cell Behavior
Published on: December 8, 2016
Yongfu Wen1, Haobo Cheng, Hon-Yuen Tam
1School of Optoelectronics, Beijing Institute of Technology, Beijing, China.
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A new stitching algorithm for annular subaperture stitching interferometry (ASSI) efficiently compensates for adjustment errors in aspheric surfaces. This method prevents error transmission and accumulation, ensuring accurate surface measurements.
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