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Laser-induced Forward Transfer for Flip-chip Packaging of Single Dies
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Common-path laser planar encoder.

Chyan-Chyi Wu1, Yan-Zou Chen, Chia-Huang Liao

  • 1Department of Mechanical and Electro-mechanical Engineering, Tamkang University, Taiwan. chyanchyi@gmail.com

Optics Express
|August 14, 2013
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Summary
This summary is machine-generated.

A novel common-path laser planar encoder (CLPE) achieves high-resolution 2D displacement measurements. This technology minimizes environmental disturbances for precise nanometer-level accuracy in X- and Y- axes.

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Area of Science:

  • Metrology and Measurement Science
  • Optical Engineering
  • Nanotechnology

Background:

  • Accurate displacement measurement is critical for advanced scientific and industrial applications.
  • Environmental disturbances pose significant challenges to achieving high-resolution measurements.
  • Existing encoders often struggle with environmental stability and precision.

Purpose of the Study:

  • To introduce and validate a common-path laser planar encoder (CLPE) for 2D displacement measurements.
  • To assess the CLPE's performance in reducing environmental disturbances.
  • To demonstrate the CLPE's capability for high-resolution and stable measurements.

Main Methods:

  • Development of a common-path laser planar encoder (CLPE) design.
  • Experimental setup for 2D displacement measurement along X- and Y- axes.
  • Comparative analysis with a standard high-precision measurement system (HP5529A).

Main Results:

  • The CLPE demonstrated excellent agreement with HP5529A measurements across various ranges.
  • Achieved high resolutions of 0.07 ± 0.021 nm (X-axis) and 0.07 ± 0.023 nm (Y-axis).
  • Exhibited high system stabilities of -0.59 ± 0.43 nm/h (X-axis) and -0.63 ± 0.47 nm/h (Y-axis).

Conclusions:

  • The common-path laser planar encoder effectively minimizes environmental disturbances.
  • The CLPE offers promising potential for nanometer-resolution and large-range displacement applications.
  • Validated performance indicates suitability for demanding metrology tasks.