Ultraclean single, double, and triple carbon nanotube quantum dots with recessed Re bottom gates

We demonstrate that ultraclean single, double, and triple quantum dots (QDs) can be formed reliably in a carbon nanotube (CNT) by a straightforward fabrication technique. The QDs are electrostatically defined in the CNT by closely spaced metallic bottom gates deposited in trenches in SiO2 by sputter deposition of Re. The carbon nanotubes are then grown by chemical vapor deposition (CVD) across the trenches and contacted using conventional resist-based electron beam lithography. Unlike in previous work, the devices exhibit reproducibly the characteristics of ultraclean QDs behavior even after the subsequent electron beam lithography and chemical processing steps. We specifically demonstrate the high quality using CNT devices with two narrow bottom gates and one global back gate. Tunable by the gate voltages, the device can be operated in four different regimes: (i) fully p-type with ballistic transport between the outermost contacts (over a length of 700 nm), (ii) clean n-type single QD behavior where a QD can be induced by either the left or the right bottom gate, (iii) n-type double QD, and (iv) triple bipolar QD where the middle QD has opposite doping (p-type). Our simple fabrication scheme opens up a route to more complex devices based on ultraclean CNTs, since it allows for postgrowth processing.