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Updated: May 8, 2026

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
Published on: May 13, 2020
Coexistence of high performance resistance and capacitance memory based on multilayered metal-oxide structures
1Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, P R China. zbyan37@gmail.com
This study presents a novel memristor and memcapacitor device with rapid switching speeds and excellent stability over 10^8 cycles. The device exhibits tunable intermediate states, offering advanced memory functionalities.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Electrical Engineering
Background:
- Memristive and memcapacitive devices are crucial for next-generation electronics.
- Developing stable and high-performance memory devices with tunable states is an ongoing challenge.
Purpose of the Study:
- To demonstrate a novel Au/DyMnO₃/Nb:SrTiO₃/Au stack as both a high-performance memristor and memcapacitor.
- To investigate the device's switching characteristics, retention, endurance, and tunable intermediate states.
Main Methods:
- Fabrication of the Au/DyMnO₃/Nb:SrTiO₃/Au device stack.
- Electrical characterization including switching speed, retention, endurance, and capacitance measurements.
- Analysis of memory effects originating from the Nb:SrTiO₃/Au junction.
Main Results:
- The device achieved switching times below 10 ns and retention exceeding 10^5 s.
- Demonstrated a resistance/capacitance change ratio greater than 100 over 10^8 switching cycles.
- Observed a broad range of tunable intermediate states controlled by operating voltages.
Conclusions:
- The Au/DyMnO₃/Nb:SrTiO₃/Au stack functions effectively as both a memristor and memcapacitor.
- Memory effects are attributed to the electrically modulated barrier profile at the Nb:SrTiO₃/Au junction.
- The device's unique electrical behavior enhances capacitance change ratio and memory stability.
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