Multi foci with diffraction limited resolution

The generation of multi foci is an established method for high-speed parallel direct laser writing, scanning microscopy and for optical tweezer arrays. However, the quality of multi foci reduces with increasing resolution due to interference effects. Here, we report on a spatial-light-modulator-based method that allows for highly uniform, close to Gaussian spots with diffraction limited resolution using a wavelength of 780 nm. We introduce modifications of a standard algorithm that calculates a field distribution on the entrance pupil of a high numerical aperture objective splitting the focal volume into a multitude of spots. Our modified algorithm compares favourably to a commonly used algorithm in full vectorial calculations as well as in point-spread-function measurements. The lateral and axial resolution limits of spots generated by the new algorithm are found to be close to the diffraction limit.