Femtosecond laser nanomachining initiated by ultraviolet multiphoton ionization

We report on the experimental results of 300 nm features generated on fused silica using a near-infrared (IR) femtosecond laser pulse initiated by an ultraviolet (UV) pulse. With both pulses at a short (~60 fs) delay, the damage threshold of the UV pulse is only 10% of its normal value. Considerable reduction of UV damage threshold is observed when two pulses are at ± 1.3 ps delay. The damage feature size of the combined pulses is similar to that of a single UV pulse. A modified rate equation model with the consideration of defect states is used to help explain these results. This concept can be applied to shorter wavelengths, e.g. XUV and X-ray, with the required fluence below their normal threshold.