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Updated: Jul 18, 2026

Cell Patterning on Photolithographically Defined Parylene-C: SiO2 Substrates
Published on: March 7, 2014
Low cost, patterning of human hNT brain cells on parylene-C with UV & IR laser machining
Abstract:
This paper describes the use of 800nm femtosecond infrared (IR) and 248nm nanosecond ultraviolet (UV) laser radiation in performing ablative micromachining of parylene-C on SiO2 substrates for the patterning of human hNT astrocytes. Results are presented that support the validity of using IR laser ablative micromachining for patterning human hNT astrocytes cells while UV laser radiation produces photo-oxidation of the parylene-C and destroys cell patterning. The findings demonstrate how IR laser ablative micromachining of parylene-C on SiO2 substrates can offer a low cost, accessible alternative for rapid prototyping, high yield cell patterning.
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