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Double transfer UV-curing nanoimprint lithography.

Yiming Shen1, Lei Yao, Zhiwei Li

  • 1Department of Materials Science and Engineering, College of Engineering and Applied Sciences, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, People's Republic of China.

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|October 30, 2013
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Summary

A new nanoimprint technique enables uniform nanopatterning on curved surfaces, overcoming fabrication challenges for non-planar substrates. This method is crucial for creating high-resolution nanostructures on diverse materials.

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Area of Science:

  • Materials Science and Engineering
  • Nanotechnology
  • Surface Science

Background:

  • Fabricating nanostructures on non-planar substrates is challenging due to difficulties in achieving uniform resist films.
  • Uniform resist films are critical for successful nanostructure fabrication using lithographic techniques and subsequent pattern transfer.

Purpose of the Study:

  • To develop a novel nanoimprint technique for creating uniform nanopatterned thin films on both flat and curved surfaces.
  • To demonstrate the applicability of the technique for high-resolution nanostructure fabrication on non-planar substrates.

Main Methods:

  • A double transfer UV-curing nanoimprint technique was developed.
  • The technique was applied to imprint surface relief gratings with pitches down to 200 nm on optical fiber surfaces.
  • Reactive ion etching (RIE) was used for pattern transfer into a SiO2 matrix.

Main Results:

  • The technique successfully created nanopatterned thin films with uniform residual layers on highly curved surfaces.
  • High-resolution surface relief gratings were imprinted on the cylindrical surface of optical fibers.
  • Pattern transfer into SiO2 was demonstrated, confirming the technique's viability.

Conclusions:

  • The double transfer UV-curing nanoimprint technique effectively addresses the challenge of uniform thin film formation on non-planar surfaces.
  • This method is suitable for fabricating high-resolution nanostructures on complex, curved substrates like optical fibers.