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Note: Complementary metal-oxide-semiconductor high voltage pulse generation circuits.

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Researchers developed novel on-chip pulse generation circuits using CMOS technology. These circuits achieve high voltage outputs, exceeding standard process limits for advanced electronic applications.

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Area of Science:

  • Electrical Engineering
  • Microelectronics
  • Integrated Circuit Design

Background:

  • Generating high-voltage pulses on-chip is crucial for various applications, including high-speed communication and advanced sensing.
  • Existing CMOS technologies face limitations in producing output voltages that exceed their rated operating or breakdown voltages.
  • On-chip pulse generation requires innovative circuit designs to overcome inherent semiconductor device constraints.

Purpose of the Study:

  • To present two novel on-chip pulse generation circuit designs.
  • To demonstrate the capability of these circuits to generate high-voltage pulses exceeding standard CMOS process limitations.
  • To extend the high-voltage pulse generation capabilities of CMOS technologies.

Main Methods:

  • Design and implementation of a CMOS pulse-forming-line (PFL) circuit featuring a four-stage charge pump and a four-stacked-MOSFET switch.
  • Design and implementation of a high-voltage Marx generator circuit utilizing stacked MOSFETs as high-voltage switches.
  • Fabrication and testing of the circuits using a 0.13 μm CMOS process.

Main Results:

  • The CMOS PFL circuit generated pulses with approximately 1.8 V amplitude and 135 ps duration on a 50 Ω load, exceeding the 1.6 V rated operating voltage.
  • The high-voltage Marx generator produced an output voltage of 11.68 V, surpassing the 10 V breakdown voltage of the CMOS process.
  • Both circuits successfully operated at voltages higher than the standard limitations of the employed CMOS technology.

Conclusions:

  • The developed on-chip pulse generation circuits significantly enhance the high-voltage capabilities of CMOS technologies.
  • The PFL and Marx generator designs offer viable solutions for generating high-voltage pulses within standard CMOS fabrication processes.
  • These advancements pave the way for new applications requiring high-voltage pulse generation integrated onto microelectronic platforms.