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Process variation in silicon photonic devices.

Xi Chen, Moustafa Mohamed, Zheng Li

    Applied Optics
    |November 13, 2013
    PubMed
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    Process variations in silicon-on-insulator optical devices cause significant differences in optical response. These variations exhibit a "random walk" pattern, quantified as approximately 1 nm²/cm, impacting device performance predictability.

    Area of Science:

    • Photonics and Materials Science
    • Integrated Optics and Semiconductor Fabrication

    Background:

    • Foundry-fabricated silicon-on-insulator (SOI) wafers contain arrays of passive optical devices like microrings, racetrack resonators, and directional couplers.
    • Characterization reveals significant variations in the optical responses of these devices, impacting their performance and uniformity.

    Purpose of the Study:

    • To quantify the process variation in passive SOI optical devices.
    • To understand the spatial correlation of these variations across fabricated wafers.
    • To establish a metric for process variation relevant to integrated photonic circuit design.

    Main Methods:

    • Fabrication of four wafers with repeating patterns of SOI optical devices.
    • Physical and optical characterization of microrings, racetrack resonators, and directional couplers.

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  • Device-heating experiments to assess thermal effects and their spatial independence.
  • Statistical analysis of optical response variations (peak wavelength) across devices at varying spatial extents.
  • Main Results:

    • Optical responses of SOI devices exhibit significant, location-independent thermal effects.
    • Room-temperature optical response variations demonstrate a spatial correlation consistent with a "random walk" pattern.
    • Process variation is quantified as approximately 1 nm²/cm, aligning with existing literature values.

    Conclusions:

    • Spatial process variations in SOI optical devices follow a predictable "random walk" model.
    • The quantified process variation (1 nm²/cm) provides a crucial parameter for designing robust integrated photonic circuits.
    • Understanding and quantifying these variations are essential for achieving reliable performance in foundry-fabricated photonic devices.