Direct photolithography of perfluoropolyethers for solvent-resistant microfluidics

In this work, photocurable perfluoropolyethers (PFPEs) have been used for the fabrication of microfluidic devices by a direct photolithographic process. During this mask-assisted photopolymerization technique, the material is directly photopolymerized in the presence of a mask, avoiding the use of a master. We demonstrate the high level of control in transferring micropattern features with high density, a minimum transferred size of 15 μm, a high aspect ratio (at least up to 6.5), and complex shapes useful for microfluidic applications. Moreover, we successfully apply this technology to fabricate sealed devices; the fabrication time scale for the overall process is around 5 min. The devices are able to withstand a flow pressure of up to 3.8 bar, as required for most microfluidics. Finally, the devices are tested with a model reaction employing organic solvents.