Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Highly uniform thermally undercut silicon photonic devices in a 300 mm CMOS foundry process.

Scientific reports·2025
Same author

Monolithically Integrated C-Band Quantum Emitters on Foundry Silicon Photonics.

Nano letters·2025
Same author

Electrically pumped quantum-dot lasers grown on 300 mm patterned Si photonic wafers.

Light, science & applications·2022
Same author

High-Q-factor Al<sub>2</sub>O<sub>3</sub> micro-trench cavities integrated with silicon nitride waveguides on silicon.

Optics express·2018
Same author

Whispering gallery germanium-on-silicon photodetector.

Optics letters·2017
Same author

Ultra-narrow-linewidth Al<sub>2</sub>O<sub>3</sub>:Er<sup>3+</sup> lasers with a wavelength-insensitive waveguide design on a wafer-scale silicon nitride platform.

Optics express·2017

Related Experiment Video

Updated: May 5, 2026

Measurement of X-ray Beam Coherence along Multiple Directions Using 2-D Checkerboard Phase Grating
10:39

Measurement of X-ray Beam Coherence along Multiple Directions Using 2-D Checkerboard Phase Grating

Published on: October 11, 2016

9.1K

Uniformly spaced λ/4-shifted Bragg grating array with wafer-scale CMOS-compatible process.

Jie Sun, Purnawirman, Ehsan Shah Hosseini

    Optics Letters
    |December 11, 2013
    PubMed
    Summary
    This summary is machine-generated.

    We developed a novel integrated Bragg grating array using a CMOS-compatible process. This advancement offers highly uniform channel spacing, paving the way for advanced silicon photonic devices.

    More Related Videos

    Writing Bragg Gratings in Multicore Fibers
    08:48

    Writing Bragg Gratings in Multicore Fibers

    Published on: April 20, 2016

    8.2K
    Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station
    05:57

    Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station

    Published on: April 1, 2020

    9.4K

    Related Experiment Videos

    Last Updated: May 5, 2026

    Measurement of X-ray Beam Coherence along Multiple Directions Using 2-D Checkerboard Phase Grating
    10:39

    Measurement of X-ray Beam Coherence along Multiple Directions Using 2-D Checkerboard Phase Grating

    Published on: October 11, 2016

    9.1K
    Writing Bragg Gratings in Multicore Fibers
    08:48

    Writing Bragg Gratings in Multicore Fibers

    Published on: April 20, 2016

    8.2K
    Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station
    05:57

    Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station

    Published on: April 1, 2020

    9.4K

    Area of Science:

    • Photonics and Optical Engineering
    • Materials Science and Engineering

    Background:

    • Integrated photonic devices are crucial for advanced optical systems.
    • Achieving precise phase shifts in Bragg gratings is essential for device performance.
    • Complementary metal-oxide semiconductor (CMOS) compatibility is key for scalable silicon photonics.

    Purpose of the Study:

    • To demonstrate an integrated lambda/4-shifted Bragg grating array.
    • To utilize a CMOS-compatible fabrication process for scalability.
    • To achieve high channel spacing uniformity for practical applications.

    Main Methods:

    • Fabrication of a sidewall grating for process simplification.
    • Implementation of a sampled Bragg grating with an equivalent phase-shift structure.
    • Integration using silicon-nitride waveguides on a wafer scale.

    Main Results:

    • Demonstration of a four-channel lambda/4-shifted Bragg grating array.
    • Achieved highly uniform channel spacing with variation below 10 pm (1.25 GHz).
    • Validated CMOS-compatible fabrication process.

    Conclusions:

    • The demonstrated Bragg grating array exhibits excellent channel spacing uniformity.
    • The CMOS-compatible process shows promise for mass production.
    • This technology is suitable for integrated distributed feedback laser arrays in silicon photonics.