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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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Activation of gas-phase uranyl: from an oxo to a nitrido complex

Yu Gong1, Valérie Vallet, Maria del Carmen Michelini

  • 1Chemical Sciences Division, Lawrence Berkeley National Laboratory , Berkeley, California 94720, United States.

The Journal of Physical Chemistry. A
|December 21, 2013
PubMed

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