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Updated: May 4, 2026
08:36
An Atmospheric Pressure Plasma Setup to Investigate the Reactive Species Formation
Published on: November 3, 2016
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[Optical emission spectroscopy of MPCVD plasma]
Zhi-bin Ma1, Jian-peng Wu2, Li-ping Tao2
1School of Materials Science and Engineering, Key Laboratory of Plasma Chemical and Advanced Materials of Hubei Province, Wuhan Institute of Technology, Wuhan 430073, China. mazb@mail.wit.edu.cn
Guang Pu Xue Yu Guang Pu Fen Xi = Guang Pu
|December 28, 2013
Summary
Optical emission spectroscopy diagnosed methane/hydrogen plasma, revealing CH, H, and C2 radicals. Higher methane concentrations increased radical intensity, particularly C2, while worsening spatial distribution uniformity.
Area of Science:
- Plasma Physics
- Spectroscopy
- Chemical Kinetics
Context:
- High-pressure microwave plasma apparatus operating at 2.45 GHz.
- Investigating methane/hydrogen (CH4/H2) gas mixtures.
- Utilizing optical emission spectroscopy for plasma diagnostics.
Purpose:
- To identify and quantify radical species present in CH4/H2 plasma.
- To determine the influence of methane concentration on radical behavior.
- To analyze the spatial distribution of radicals within the plasma.
Summary:
- The study identified CH, H (Halpha, Hbeta, Hgamma), C2 radicals, and trace Mo impurities in the CH4/H2 plasma.
- Radical emission intensities, especially C2, significantly increased with rising methane concentration.
- While the CH to Halpha ratio remained constant, the C2 to Halpha ratio markedly increased, indicating altered radical dynamics.
Impact:
- Provides fundamental data on radical formation and behavior in CH4/H2 plasmas.
- Highlights the effect of methane concentration on plasma composition and uniformity.
- Informs optimization of plasma processes involving methane, such as chemical vapor deposition or etching.
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