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Cooling Rate Dependent Ellipsometry Measurements to Determine the Dynamics of Thin Glassy Films
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Ellipsometry with polarisation analysis at cryogenic temperatures inside a vacuum chamber.

S Bauer1, B Grees1, D Spitzer1

  • 1Institut für Kernphysik, Westfälische Wilhelms-Universität Münster, D-48149 Münster, Germany.

The Review of Scientific Instruments
|January 7, 2014
PubMed
Summary

This study introduces a novel null ellipsometry technique for measuring cryogenic thin films. The method accurately determines optical properties and thicknesses of thin films at low temperatures.

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Area of Science:

  • Materials Science
  • Optical Physics
  • Cryogenics

Background:

  • Ellipsometry is a powerful technique for characterizing thin films.
  • Traditional null ellipsometry requires rotating both polarizer and analyzer.
  • Measuring optical properties of cryogenic films presents unique challenges.

Purpose of the Study:

  • To develop a modified null ellipsometry technique for thin film analysis at cryogenic temperatures.
  • To enable in-situ measurements of cryogenic films within a vacuum chamber.
  • To overcome limitations of conventional methods in cold environments.

Main Methods:

  • A modified Polarizer-Compensator-Sample-Analyzer (PCSA) ellipsometry setup was employed.
  • The polarizer and compensator were rotated while the analyzer remained fixed.
  • The technique was tested on condensed krypton films on a highly oriented pyrolytic graphite (HOPG) substrate at 25 K.

Main Results:

  • The new null ellipsometry variant successfully determined film thicknesses and optical properties.
  • Refractive indices for condensed krypton and the HOPG substrate were accurately measured.
  • The method proved effective for cryogenic thin film characterization.

Conclusions:

  • The developed null ellipsometry variant is suitable for precise thin film analysis at cryogenic temperatures.
  • This technique facilitates in-situ optical characterization of materials in cold environments.
  • The method offers a reliable approach for determining optical constants and thicknesses of cryogenic films.