Field Effect Transistor
Semiconductors
Types of Semiconductors
Biasing of FET
Metal-Semiconductor Junctions
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Updated: May 3, 2026

The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
Published on: May 24, 2020
Yuan Liu1, Hailong Zhou, Rui Cheng
1Department of Materials Science and Engineering, ‡Department of Chemistry and Biochemistry, and §California Nanosystems Institute, University of California , Los Angeles, California 90095, United States.
Highly flexible vertical thin-film transistors (TFTs) utilizing graphene-amorphous indium gallium zinc oxide (IGZO) junctions achieve superior electrical performance and mechanical robustness for macroelectronic applications.
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