Reliable optical characterization of e-beam evaporated TiO2 films deposited at different substrate temperatures

We studied e-beam evaporated TiO2 films deposited at two different substrate temperatures between 120°C and 300°C. We reliably characterized the film samples on the basis of in situ and ex situ measurements. We carried out annealing on the samples and studied the induced changes in the properties of the films. The results can be useful for further laser-induced damage threshold investigations.