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Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources.

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    Structuring collector mirrors with infrared gratings can mitigate high energy loads in extreme-ultraviolet (EUV) lithography. This technique suppresses unwanted infrared light, improving optical system performance for high-volume manufacturing.

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    Area of Science:

    • Optics and Photonics
    • Materials Science
    • Semiconductor Manufacturing

    Background:

    • Laser-produced plasma sources are key for extreme-ultraviolet (EUV) lithography due to high power at 13.5 nm.
    • Significant infrared (IR) light from CO2 drive lasers is reflected and scattered, causing high energy loads on molybdenum-silicon mirrors.
    • Current optical systems face challenges with IR light due to high reflectance of EUV mirrors at these wavelengths.

    Purpose of the Study:

    • To investigate the effectiveness of structuring EUV multilayer collector mirrors with an IR grating.
    • To characterize the performance of such optical elements for IR suppression and EUV transmission.
    • To link measurement results to specific manufacturing steps for process optimization.

    Main Methods:

    • Fabrication of EUV multilayer mirrors incorporating an IR grating structure.
    • Measurement of IR diffraction efficiency in the zeroth order for high IR-suppression.
    • Characterization of EUV performance, including reflectance and scattering.
    • Surface roughness analysis relevant to manufacturing processes.

    Main Results:

    • Demonstrated high IR-suppression in the zeroth order of the structured grating.
    • Quantified EUV performance, including reflectance and scattering characteristics.
    • Correlated optical performance metrics with individual manufacturing steps.

    Conclusions:

    • Structuring collector mirrors with IR gratings is a viable strategy to reduce IR energy loads in EUV lithography systems.
    • The characterized optical elements show promising performance for mitigating unwanted IR radiation.
    • Understanding the link between manufacturing and performance is crucial for optimizing EUV optical components.