Surface force measurements between titanium dioxide surfaces prepared by atomic layer deposition in electrolyte solutions reveal non-DLVO interactions: influence of water and argon plasma cleaning

Surface force measurements between titania surfaces in electrolyte solutions have previously revealed an unexplained long-range repulsive force at high pH, not described by Derjaguin, Landau, Verwey, and Overbeek (DLVO) theory. Here, the surface forces between titania surfaces produced by atomic layer deposition (ALD) and cleaned using a variety of methods have been measured to determine the influence of the cleaning protocol on the measured forces and test the hypothesis that water plasma cleaning of the surface results in non-DLVO forces at high pH. For argon plasma and water plasma cleaned surfaces, a diffuse double layer repulsion and van der Waals attraction is observed near the isoelectric point. At high pH, the force remained repulsive up until contact, and no van der Waals attraction or adhesion was observed. Differences in the measured forces are explained by modification of the surface chemistry during cleaning, which alters the density of charged groups on the surface, but this cannot explain the observed disagreement with DLVO theory at high pH.