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Boron ion beam generation using a self-sputtering planar magnetron.

Aleksey Vizir1, Aleksey Nikolaev1, Efim Oks1

  • 1High Current Electronics Institute, Russian Academy of Sciences, Tomsk 634055, Russia.

The Review of Scientific Instruments
|March 6, 2014
PubMed
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A novel boron ion source was developed using a heated solid boron target and pulsed magnetron discharge. This method efficiently generates a high-current boron ion beam with over 95% purity.

Area of Science:

  • Plasma physics
  • Ion beam generation
  • Materials science

Background:

  • Developing efficient ion sources is crucial for various applications.
  • Boron's low conductivity presents challenges for plasma discharge ignition.
  • Existing methods for boron plasma generation are often inefficient or complex.

Purpose of the Study:

  • To develop a stable and efficient boron ion source.
  • To overcome the conductivity limitations of solid boron targets.
  • To achieve high-current boron ion beam generation.

Main Methods:

  • Utilized a planar magnetron discharge with a solid boron target.
  • Pre-heated the boron target to over 350°C using a low-current DC discharge to enhance conductivity.
  • Employed a high-current pulse (100 μs) to initiate self-sputtering and generate boron plasma.

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  • Extracted a boron ion beam using a 20 kV accelerating voltage.
  • Main Results:

    • Successfully developed a boron ion source capable of high-current discharge.
    • Achieved a boron ion beam current exceeding 150 mA.
    • Obtained a high boron ion fraction of 95% in the extracted beam.
    • Demonstrated that a "keeping alive" DC discharge eliminates time delay and reduces working pressure for pulsed discharge.

    Conclusions:

    • The developed boron ion source is effective for generating high-current, high-purity boron ion beams.
    • Pre-heating the target and using a "keeping alive" DC discharge are key to overcoming boron's low conductivity and ensuring stable operation.
    • This technology offers a promising solution for applications requiring boron ion beams.