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Updated: May 1, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Sunghwan Kim1, Benedetto Marelli2, Mark A Brenckle3
11] Department of Biomedical Engineering, Tufts University, 4 Colby Street, Medford, Massachusetts 02155, USA [2] [3].
This study introduces silk as a novel, eco-friendly resist for electron-beam lithography (EBL). This water-based method simplifies nanofabrication, offering a sustainable alternative for creating nanoscale structures.
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