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UV spectral filtering by surface structured multilayer mirrors.

Qiushi Huang, Daniel Mathijs Paardekooper, Erwin Zoethout

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    |April 3, 2014
    PubMed
    Summary
    This summary is machine-generated.

    A novel multilayer mirror with silicon pyramids effectively suppresses UV light while reflecting extreme ultraviolet (EUV) light. This technology offers a robust solution for spectral purity in XUV sources.

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    Area of Science:

    • Optics and Photonics
    • Materials Science

    Background:

    • Extreme ultraviolet (EUV) light sources often emit unwanted longer wavelength radiation.
    • Achieving spectral purity is crucial for applications utilizing EUV light.

    Purpose of the Study:

    • To develop a surface-structured multilayer mirror for simultaneous UV suppression and EUV high reflectance.
    • To demonstrate a fabrication method for such a mirror structure.

    Main Methods:

    • Fabrication of a multilayer mirror featuring silicon (Si) pyramid surface structures.
    • Utilizing the differential optical properties of Si pyramids for UV reflection and EUV transparency.
    • Employing blazed diffraction, interference, and absorption for UV light filtering.

    Main Results:

    • The developed mirror achieved full band suppression of ultraviolet (UV) light (100-400 nm).
    • High reflectance for extreme ultraviolet (EUV) light at 13.5 nm was demonstrated.
    • An average UV suppression factor of 14 times was recorded.
    • EUV reflectance reached 56.2% at 13.5 nm.

    Conclusions:

    • The surface-structured multilayer mirror provides an effective spectral purity solution for XUV sources.
    • The straightforward deposition technique enables robust fabrication of these mirrors.
    • This technology is applicable to various XUV sources emitting longer wavelengths.