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Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers
Published on: June 30, 2018
Negative-tone block copolymer lithography by in situ surface chemical modification
Bong Hoon Kim1, Kyeong-Jae Byeon, Ju Young Kim
1Center for Nanomaterials and Chemical Reactions, Institute for Basic Science (IBS), Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea.
This study introduces a novel block copolymer (BCP) lithography method for efficient nanopatterning. The technique uses in situ surface modification to create vertical BCP nanodomains on diverse substrates without pre-treatment.
Area of Science:
- Materials Science
- Nanotechnology
- Polymer Chemistry
Background:
- Block copolymer (BCP) lithography is a key technique for creating nanoscale patterns.
- Achieving vertical BCP nanodomain alignment often requires complex surface pre-treatments.
- Existing methods can be limited in versatility and efficiency for various substrates.
Purpose of the Study:
- To develop a highly efficient and versatile nanopatterning method using block copolymer lithography.
- To enable the formation of vertical BCP nanodomains on diverse substrates without prior chemical treatment.
- To establish a straightforward approach for site-specific BCP nanopatterning compatible with directed self-assembly.
Main Methods:
- Utilized negative-tone block copolymer (BCP) lithography with in situ surface chemical modification.
- Employed BCP blends of end-functionalized poly(styrene-ran-methyl methacrylate) and polystyrene-block-Poly(methyl methacrylate).
- Applied oxygen plasma treatment to activate surface functional groups for covalent bonding during thermal annealing.
Main Results:
- Successfully produced surface vertical BCP nanodomains on various substrates.
- Demonstrated covalent bonding of end-functionalized polymers via an activated brush layer.
- Achieved neutral interfacial conditions promoting vertical BCP nanodomain alignment.
- Enabled single-step, site-specific nanopatterning with high aspect ratios.
Conclusions:
- The developed BCP lithography offers an efficient and versatile method for self-assembled nanopatterning.
- This approach simplifies the process by eliminating the need for pre-surface chemical treatment.
- The technique is compatible with directed self-assembly for creating laterally ordered nanopatterns, broadening its applicability in device fabrication.
