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Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
Published on: November 1, 2013
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1.3-μm InAs/GaAs quantum-dot lasers monolithically grown on Si substrates using InAlAs/GaAs dislocation filter layers
Optics Express
|June 13, 2014
Summary
InAlAs/GaAs superlattices effectively block dislocations in quantum-dot lasers grown on silicon. This advancement enables efficient 1.3-μm lasing on silicon substrates.
Area of Science:
- Materials Science
- Semiconductor Physics
- Optoelectronics
Background:
- Directly growing high-performance laser structures on silicon substrates is challenging due to lattice mismatch and defect generation.
- Quantum-dot lasers offer potential for on-chip integration, but require effective defect management for silicon compatibility.
- Strained-layer superlattices (SLSs) are investigated as potential solutions for defect reduction in heterostructures.
Purpose of the Study:
- To compare the effectiveness of Indium Aluminum Arsenide/Gallium Arsenide (InAlAs/GaAs) and Indium Gallium Arsenide/Gallium Arsenide (InGaAs/GaAs) strained-layer superlattices (SLSs) as dislocation filter layers.
- To evaluate these SLSs in 1.3-micrometer (μm) InAs/GaAs quantum-dot laser structures grown directly on silicon (Si) substrates.
- To demonstrate the performance of quantum-dot lasers on Si using optimized dislocation filtering.
Main Methods:
- Fabrication of 1.3-μm InAs/GaAs quantum-dot laser structures on Si substrates.
- Incorporation of InAlAs/GaAs SLSs and InGaAs/GaAs SLSs as dislocation filter layers.
- Characterization of threading dislocation propagation through the SLSs.
- Performance testing of broad-area lasers, including threshold current density and output power at room temperature.
Main Results:
- InAlAs/GaAs SLSs demonstrated superior performance in blocking threading dislocations compared to InGaAs/GaAs SLSs.
- The effectiveness of InAlAs/GaAs SLSs was attributed to their ability to mitigate dislocations originating at the GaAs buffer/Si substrate interface.
- Broad-area lasers grown on Si substrates utilizing InAlAs/GaAs dislocation filter layers achieved room-temperature lasing at approximately 1.27 μm.
- These lasers exhibited a low threshold current density of 194 A/cm² and a substantial output power of approximately 77 mW.
Conclusions:
- InAlAs/GaAs strained-layer superlattices are highly effective dislocation filter layers for InAs/GaAs quantum-dot lasers on Si.
- The use of InAlAs/GaAs SLSs enables the successful direct growth of high-performance 1.3-μm laser devices on silicon substrates.
- This work represents a significant step towards realizing integrated optoelectronics on silicon platforms.

