Induction of Strand Breaks in DNA films by Low Energy Electrons and Soft X-ray under Nitrous Oxide Atmosphere

Five-monolayer (5ML) plasmid DNA films deposited on glass and tantalum substrates were exposed to Al K_α X-rays of 1.5 keV under gaseous nitrous oxide (N₂O) at atmospheric pressure and temperature. Whereas the damage yields for DNA deposited on glass are due to soft X-rays, those arising from DNA on tantalum are due to both the interaction of low energy photoelectrons from the metal and X-rays. Then, the differences in the yields of damage on glass and tantalum substrates, essentially arises from interaction of essentially low-energy electrons (LEEs) with DNA molecules and the surrounding atmosphere. The G-values (i.e., the number of moles of product per Joule of energy absorbed) for DNA strand breaks induced by LEEs (G_LEE) and the lower limit of G-values for soft X-ray photons (G_XL) were calculated and the results compared to those from previous studies under atmospheric conditions and other ambient gases, such as N₂ and O₂. Under N₂O, the G-values for loss of supercoiled DNA are 103±15 nmol/J for X-rays, and 737±110 nmol/J for LEEs. Compared to corresponding values in an O₂ atmosphere, the effectiveness of X-rays to damage DNA in N₂O is less, but the G value for LEEs in N₂O is more than twice the corresponding value for an oxygenated environment. This result indicates a higher effectiveness for LEEs relative to N₂ and O₂ environments in causing SSB and DSB in an N₂O environment. Thus, the previously observed radiosensitization of cells by N₂O may not be only due to OH^• radicals but also to the reaction of LEE with N₂O molecules near DNA. The previous experiments with N₂ and O₂ and the present one demonstrate the possibility to investigate damage induced by LEEs to biomolecules under various type of surrounding atmospheres.