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Updated: Apr 26, 2026

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Fabrication And Characterization Of Photonic Crystal Slow Light Waveguides And Cavities
Published on: November 30, 2012
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Printable planar lightwave circuits with a high refractive index
Carlos Pina-Hernandez1, Alexander Koshelev, Lucas Digianantonio
1aBeam Technologies, 22290 Foothill Blvd, St. 2, Hayward, CA 94541, USA.
Nanotechnology
|July 26, 2014
Summary
Researchers developed a new nanofabrication technique for printable integrated circuits. This method enables the creation of visible light photonic circuits using ultraviolet nanoimprinting of titanium dioxide resists.
Area of Science:
- Nanofabrication
- Optoelectronics
- Materials Science
Background:
- Integrated circuits are essential for modern electronics.
- Developing printable photonic circuits for visible light applications is a growing area of research.
- Titanium dioxide (TiO2) offers a high refractive index suitable for optical applications.
Purpose of the Study:
- To introduce a novel nanofabrication method for creating printable integrated circuits.
- To fabricate planar lightwave circuits operating in the visible wavelength range.
- To demonstrate the functionality of printed photonic components.
Main Methods:
- Utilizing ultraviolet (UV) nanoimprinting for direct imprinting.
- Employing functional TiO2-based resist on planar waveguide core films.
- Fabricating elementary photonic components such as ridge waveguides, light splitters, and digital planar holograms.
Main Results:
- Successfully fabricated printable planar lightwave circuits with a high refractive index.
- Demonstrated multi-mode ridge waveguides with propagation losses of approximately 40 dB cm(-1) at 660 nm.
- Achieved on-chip demultiplexers operating in the visible range with 100 channels and 0.35 nm spectral channel spacing.
Conclusions:
- The novel nanofabrication method enables the production of printable photonic circuits for visible light.
- The demonstrated components show promising performance for integrated optical applications.
- This technique opens possibilities for low-cost, large-area fabrication of photonic devices.

