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A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
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Narrow-gap semiconductors and low-dimensional structures for optoelectronic applications
Fangyu Yue1, Satyabrata Jit2, Weida Hu3
1Key Laboratory of Polar Materials and Devices of MOE, East China Normal University, Shanghai 200241, China.
Thescientificworldjournal
|August 23, 2014
Summary
No abstract available in PubMed .
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